The effect of boron on the microstructure and physical properties of chemically vapour deposited nickel films

A. N. Campbell; A. W. Mullendore; C. R. Hills; J. B. Vandersande

doi:10.1007/bf01106834

journal article Nov 01, 1988

The effect of boron on the microstructure and physical properties of chemically vapour deposited nickel films

A. N. Campbell A. W. Mullendore C. R. Hills J. B. Vandersande

Journal of Materials Science Vol. 23 No. 11 pp. 4049-4058 · Springer Science and Business Media LLC

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Published: Nov 01, 1988
Vol/Issue: 23(11)
Pages: 4049-4058
License: View

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A. N. Campbell, A. W. Mullendore, C. R. Hills, et al. (1988). The effect of boron on the microstructure and physical properties of chemically vapour deposited nickel films. Journal of Materials Science, 23(11), 4049-4058. https://doi.org/10.1007/bf01106834

The effect of boron on the microstructure and physical properties of chemically vapour deposited nickel films

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