Block copolymers and conventional lithography

Mark P. Stoykovich; Paul F. Nealey

doi:10.1016/s1369-7021(06)71619-4

journal article Open Access Sep 01, 2006

Block copolymers and conventional lithography

Mark P. Stoykovich Paul F. Nealey

Materials Today Vol. 9 No. 9 pp. 20-29 · Elsevier BV

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353

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106

References

Details

Published: Sep 01, 2006
Vol/Issue: 9(9)
Pages: 20-29
License: View

Authors

Institute for Molecular Engineering University of Chicago 5640 South Ellis Avenue Chicago IL 60637 USA; Materials Science Division Argonne National Laboratory 9700 South Cass Avenue Argonne IL 60439 USA

Cite This Article

Mark P. Stoykovich, Paul F. Nealey (2006). Block copolymers and conventional lithography. Materials Today, 9(9), 20-29. https://doi.org/10.1016/s1369-7021(06)71619-4

Block copolymers and conventional lithography

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