Atom and Ion Chemistry in Low Pressure Hydrogen DC Plasmas

I. Méndez; F. J. Gordillo-Vázquez; V. J. Herrero; I. Tanarro

doi:10.1021/jp057182+

journal article Apr 14, 2006

Atom and Ion Chemistry in Low Pressure Hydrogen DC Plasmas

I. Méndez F. J. Gordillo-Vázquez V. J. Herrero

I. Tanarro

The Journal of Physical Chemistry A Vol. 110 No. 18 pp. 6060-6066 · American Chemical Society (ACS)

View at Publisher Save 10.1021/jp057182+

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References

55

[1]

Herbst E. Astrophys. J. (1973) 10.1086/152436

[2]

Watson W. D. Astrophys. J. (1973) 10.1086/181242

[3]

Oka T. Phys. Rev. Lett. (1980) 10.1103/physrevlett.45.531

[4]

McCall B. J. Science (2000) 10.1126/science.287.5460.1941

[5]

Petrović Z. L. Phys. Rev. Lett. (1992) 10.1103/physrevlett.68.325

[6]

St-Onge L. Plasma Chem. Plasma Proc. (1994) 10.1007/bf01465741

[7]

Gicquel A. Appl. Phys. (1998) 10.1063/1.367514

[8]

von Keudell, A.; Jacob, W.Prog.Surf. Sci.2004,

[9]

Gorse C. Chem. Phys. (1987) 10.1016/0301-0104(87)80120-9

[10]

Loureiro, J.; Ferreira, C. M.J. Phys. D: Appl. Phys.1989,22, 1680. 10.1088/0022-3727/22/11/017

[11]

Gorse C. Chem. Phys. (1992) 10.1016/0301-0104(92)80188-2

[12]

Garscadden A. Plasma Sources Sci. Technol. (1995) 10.1088/0963-0252/4/2/011

[13]

Matveyev A. A. Plasma Sources Sci. Technol. (1995) 10.1088/0963-0252/4/4/012

[14]

Hassouni K. Plasma Sources, Sci. Technol. (1999) 10.1088/0963-0252/8/3/320

[15]

Capitelli M. Phys. Rev. E (2004) 10.1103/physreve.69.026412

[16]

Laricchiuta A. Phys. Rev. A (2004) 10.1103/physreva.69.022706

[17]

Shakhatov V. A. Phys. Plasmas (2005) 10.1063/1.1829065

[18]

Hassouni K. Phys. Plasmas (2005) 10.1063/1.1931675

[19]

Bacal M. Phys. Rev. Lett. (1979) 10.1103/physrevlett.42.1538

[20]

Kalache, B.; Novikova, T.; Fontcuberta i Morral, A.; Roca i Cabarrocas, P.; Morscheidt, W.; Hassouni, K.J. Phys. D: Appl. Phys.2004,37, 1765. 10.1088/0022-3727/37/13/007

[21]

Diomede P. Eur. Phys. J. D. (2005) 10.1140/epjd/e2005-00037-5

[22]

Tawara H. J. Phys. Chem. Ref. Data. (1990) 10.1063/1.555856

[23]

Phelps A. V. J. Phys. Chem. Ref. Data. (1990) 10.1063/1.555858

[24]

Celiberto R. At Data Nucl. Data Tables (2001) 10.1006/adnd.2000.0850

[25]

Celiberto R. Ohys. Scr. (2002)

[26]

Capitelli M. Plasma Sources Sci. Technol. (2002) 10.1088/0963-0252/11/3a/302

[27]

Pigarov A. Yu. Phys. Scr. (2002) 10.1238/physica.topical.096a00016

[28]

Albella J. M. Surf. Coat. Technol. (1995) 10.1016/0257-8972(94)02272-r

[29]

Lee S. T. Mater. Sci. Eng. (1999) 10.1016/s0927-796x(99)00003-0

[30]

Marinkovic S. N. Chem. Phys. Carbon (2004) 10.1201/9780203997031.ch2

[31]

Hollmann E. M. Phys. Plasmas (2002) 10.1063/1.1503070

[32]

Hollmann E. M. Rev. Sci. Instrum. (2001) 10.1063/1.1310594

[33]

Geobel D. M. J. Nucl. Mater. (1984)

[34]

Castillo M. J. Phys. Chem. A (2005) 10.1021/jp045731q

[35]

Tabarés F. L. Vacuum (2004) 10.1016/j.vacuum.2003.12.045

[36]

Tabarés F. L. Plasma Phys. Controlled Fusion (2002) 10.1088/0741-3335/44/8/101

[37]

De J. Phys. Chem. A (1998) 10.1021/jp981749n

[38]

Laframboise J. G. (1966)

[39]

Allen J. E. Plasma Sources Sci. Technol. (1995) 10.1088/0963-0252/4/2/007

[40]

Schott L. (1995)

[41]

(1991)

[42]

Lavrov B. P. Phys. Rev. E (1999) 10.1103/physreve.59.3526

[43]

Qing Z. J. Appl. Phys. (1996) 10.1063/1.362930

[44]

Lavrov B. P. Plasma Sources Sci. Technol. (2003) 10.1088/0963-0252/12/4/309

[45]

Lavrov B. P. At. Spectrosc. (2002)

[46]

Pipa A V, Ph.D. (2004)

[47]

Laborie P. (1968)

[48]

Anicich V. G. J. Phys. Chem. Ref. Data. (1993) 10.1063/1.555940

[49]

Datz S. Phys. Rev. Lett. (1995) 10.1103/physrevlett.74.896

[50]

Chantry P. J. J. Appl. Phys. (1987) 10.1063/1.339662

Showing 50 of 55 references

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Details

Published: Apr 14, 2006
Vol/Issue: 110(18)
Pages: 6060-6066

Authors

I

I. Méndez

Instituto de Estructura de la Materia, CSIC, Serrano 123, 28006 Madrid, Spain, and Instituto de Óptica, CSIC, Serrano 121, 28006 Madrid, Spain

F

F. J. Gordillo-Vázquez

Instituto de Estructura de la Materia, CSIC, Serrano 123, 28006 Madrid, Spain, and Instituto de Óptica, CSIC, Serrano 121, 28006 Madrid, Spain

V

V. J. Herrero

Instituto de Estructura de la Materia, CSIC, Serrano 123, 28006 Madrid, Spain, and Instituto de Óptica, CSIC, Serrano 121, 28006 Madrid, Spain

I

I. Tanarro

Instituto de Estructura de la Materia, CSIC, Serrano 123, 28006 Madrid, Spain, and Instituto de Óptica, CSIC, Serrano 121, 28006 Madrid, Spain

Cite This Article

I. Méndez, F. J. Gordillo-Vázquez, V. J. Herrero, et al. (2006). Atom and Ion Chemistry in Low Pressure Hydrogen DC Plasmas. The Journal of Physical Chemistry A, 110(18), 6060-6066. https://doi.org/10.1021/jp057182+

Atom and Ion Chemistry in Low Pressure Hydrogen DC Plasmas

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