journal article Open Access Jun 27, 2013

Solution-Processed Flexible Fluorine-doped Indium Zinc Oxide Thin-Film Transistors Fabricated on Plastic Film at Low Temperature

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References
32
[1]
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

Kenji Nomura, Hiromichi Ohta, Akihiro Takagi et al.

Nature 2004 10.1038/nature03090
[2]
Hosono, H. et al. Ionic amorphous oxide semiconductors: Material design, carrier transport and device application. J. Non-Cryst. Solids 352, 851–858 (2006). 10.1016/j.jnoncrysol.2006.01.073
[3]
Pasquarelli, R. M., Ginleyb, D. S. & O'Hayrea, R. Solution processing of transparent conductors: from flask to film. Chem. Soc. Rev. 40, 5406–5441 (2011). 10.1039/c1cs15065k
[4]
Song, K. et al. Fully Flexible Solution-Deposited ZnO Thin-Film Transistors. Adv. Mater. 22, 4308–4312 (2010). 10.1002/adma.201002163
[5]
Kim, Y.-H. et al. Flexible metal-oxide devices made by room-temperature photochemical activation of sol-gel films. Nature 489, 128–133 (2012). 10.1038/nature11434
[6]
Banger, K. K. et al. Low-temperature, high-performance solution-processed metal oxide thin-film transistors formed by a ‘sol-gel on chip’ process. Nat. Mater. 10, 45–50 (2011). 10.1038/nmat2914
[7]
Kim, M. G., Kanatzidis, M. G., Facchetti, A. & Marks, T. J. Low-temperature fabrication of high-performance metal oxide thin-film electronics via combustion processing. Nat. Mater. 10, 382–388 (2011). 10.1038/nmat3011
[8]
Hwang, Y. H. et al. An aqueous route for low temperature processable oxide flexible transparent thin-film transistors on a plastic substrate. NPG. Asia 5, e45 (2013). 10.1038/am.2013.11
[9]
Rim, Y. S. et al. Simultaneous modification of pyrolysis and densification for low-temperature solution-processed flexible oxide thin-film transistors. J. Mater. Chem. 22, 12491–12509 (2012). 10.1039/c2jm16846d
[10]
Review of recent developments in amorphous oxide semiconductor thin-film transistor devices

Joon Seok Park, Wan-Joo Maeng, Hyun-Suk Kim et al.

Thin Solid Films 2012 10.1016/j.tsf.2011.07.018
[11]
Jeon, J.-H., Hwang, Y. H., Jin, J. & Bae, B.-S. Low-temperature aqueous solution processed fluorine-doped zinc tin oxide thin-film transistors. MRS comm. 2, 17–22 (2012). 10.1557/mrc.2012.1
[12]
Shanthi, E., Banerjee, A. & Chopra, K. L. Dopant effects in sprayed tin oxide films. Thin Solid Films 88, 93–100 (1982). 10.1016/0040-6090(82)90330-3
[13]
Tseng, H.-H. et al. Defect passivation with fluorine in a TaxCy/high-k gate stack for enhanced device threshold voltage stability and performance. IEDM Tech. Dig. 29, 4.1–4.4 (2005).
[14]
Morales-Saavedra, O. G., Castaneda, L., Banuelos, J. G. & Ortega-Martinez, R. Morphological, Optical and Nonlinear Optical properties of Fluorine-Indium-Doped Zinc Oxide Thin Films. Nonlinear optics and spectroscopy 18, 283–291 (2008).
[15]
Jeon, J.-H., Hwang, Y. H. & Bae, B.-S. Bias-temperature-illumination stability of aqueos solution processed fluorine doped zinc tin oxide (ZTO:F) transistor. Electrochem. Solid State Lett. 15, H123–H125 (2012). 10.1149/2.004205esl
[16]
Lee, D.-H., Chang, Y.-J., Herman, G. S. & Chang, C.-H. A general route to printable high-mobility transparent amorphous oxide semiconductors. Adv. Mater. 19, 843–847 (2007). 10.1002/adma.200600961
[17]
Srivastava, O. K. & Secco, E. A. Studies on metal hydroxyl compounds. I. Thermal analyses of zinc derivatives ε-Zn(OH)2, Zn5(OH)8Cl2H2O, β-ZnOHCl and ZnOHF. Can. J. Chem. 45, 579–583 (1967). 10.1139/v67-096
[18]
Wood, S. A. & Samson, I. M. The aqueous geochemistry of gallium, germanium, indium and scandium. Ore. Geol. Rev. 28, 57–102 (2006). 10.1016/j.oregeorev.2003.06.002
[19]
Yang, J., Frost, R. L. & Martens, W. N. Thermogravimetric analysis and hot-stage Raman spectroscopy of cubic indium hydroxide. J. Therm. Anal. Calorim. 100, 109–116 (2010). 10.1007/s10973-009-0554-x
[20]
Mastelaro, V., Ribeiro, S., Messaddeq, Y. & Aegerter, M. EXAFS and Raman spectroscopy study of binary indium fluoride glasses. J. Mater. Sci. 31, 3441–3446 (1996). 10.1007/bf00360746
[21]
Porto, S. P. S., Fleury, P. A. & Damen, T. C. Raman spectra of TiO2, MgF2, ZnF2, FeF2 and MnF2 . Phys. Rev. 154, 522–526 (1966). 10.1103/physrev.154.522
[22]
Peter, S., Weckler, B., Roisnel, T. & Lutz, H. D. Linear, bent and trifurcated OH- F- hydroge bonds: Neutron powder diffraction, infrared and Raman spectroscopies of Zn(OD)F I and Zn(OD)F la*. Bull. Chem. Technol. Macedonia 16, 21–32 (1997).
[23]
Lutz, H. D., Schmidt, M. & Weckler, B. Infrared and Raman studies on calcium, zinc and cadmium hydroxide halides Ca{O(H,D)}Cl, Cd{O(H,D)}Cl, Zn{O(H,D)}F and β-Zn{O(H,D)}Cl. J. Raman Spectrosc. 24, 797–804 (1993). 10.1002/jrs.1250241113
[24]
Cusco, R. et al. Temperature dependence of Raman scattering in ZnO. Phys. Rev. B 75, 165202 (2007). 10.1103/physrevb.75.165202
[25]
Kawamotoa, Y., Ogurab, K., Shojiyab, M., Takahashib, M. & Kadono, K. F1s XPS of fluoride glasses and related fluoride crystals. J. Fluorine Chem. 96, 135–139 (1999). 10.1016/s0022-1139(99)00068-8
[26]
Jeong, S., Ha, Y.-G., Moon, J., Facchetti, A. & Marks, T. J. Role of gallium doping in dramatically lowering amorphous-oxide procession temperautures for solution-derived indium zinc oxide thin-film transistors. Adv. Mater. 22, 1346–1350 (2010). 10.1002/adma.200902450
[27]
Wager, J. F., Keszler, D. A. & Presley, R. E. Transparent Electronics Chap. 5 (Springer, USA, 2008).
[28]
Ji, K. H. et al. The effect of density-of-state on the temperature and gate bias-induced instability of InGaZnO Thin Film Transistors. Electrochem. Solid State Lett. 157, H983–H986 (2010).
[29]
Atkins, P., Overton, T., Rourke, J., Weller, M. & Armstong, F. Inorganic Chemistry Chap. 9 (Oxford, UK, 2006).
[30]
Jeong, J. K., Yang, H. W., Jeong, J. H., Mo, Y.-G. & Kim, H. D. Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors. Appl. Phys. Lett. 93, 123508 (2008). 10.1063/1.2990657
[31]
Liu, P.-T., Chou, Y.-T. & Teng, L.-F. Environment-dependent metastability of passivation-free indium zinc oxide thin film transistor after gate bias stress. Appl. Phys. Lett. 65, 233504 (2009). 10.1063/1.3272016
[32]
Park, J.-S., Jeong, J. K., Chung, H.-J., Mo, Y.-G. & Kim, H. D. Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water. Appl. Phys. Lett. 92, 072104 (2008). 10.1063/1.2838380
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Journal of Materials Chemistry C
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Jun 27, 2013
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Jin-Suk Seo, Jun-Hyuck Jeon, Young Hwan Hwang, et al. (2013). Solution-Processed Flexible Fluorine-doped Indium Zinc Oxide Thin-Film Transistors Fabricated on Plastic Film at Low Temperature. Scientific Reports, 3(1). https://doi.org/10.1038/srep02085