Atomic layer deposited high quality AlN thin films for efficient thermal management

Wangle Zhang; Jianguo Li; Jiabin Fang; Longfei Hui; Lijun Qin; Ting Gong; Fangyuan Sun; Hao Feng

doi:10.1039/d3ta04618d

journal article Jan 01, 2023

Atomic layer deposited high quality AlN thin films for efficient thermal management

Wangle Zhang Jianguo Li

Jiabin Fang Longfei Hui Lijun Qin Ting Gong

Fangyuan Sun

Hao Feng

Journal of Materials Chemistry A Vol. 11 No. 40 pp. 21846-21856 · Royal Society of Chemistry (RSC)

View at Publisher Save 10.1039/d3ta04618d

Abstract

With the development of high-power devices, thermal management has become extremely important for modern electronics.

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Details

Published: Jan 01, 2023
Vol/Issue: 11(40)
Pages: 21846-21856
License: View

Authors

W

Wangle Zhang

Laboratory of Material Surface Engineering and Nanofabrication, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China

J

Jianguo Li

Laboratory of Material Surface Engineering and Nanofabrication, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China

J

Jiabin Fang

Laboratory of Material Surface Engineering and Nanofabrication, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China

L

Longfei Hui

Laboratory of Material Surface Engineering and Nanofabrication, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China; Science and Technology on Combustion and Explosion Laboratory, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China

L

Lijun Qin

Laboratory of Material Surface Engineering and Nanofabrication, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China; Science and Technology on Combustion and Explosion Laboratory, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China

T

Ting Gong

Laboratory of Material Surface Engineering and Nanofabrication, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China; Science and Technology on Combustion and Explosion Laboratory, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China

F

Fangyuan Sun

School of Energy and Environmental Engineering, University of Science and Technology Beijing, Beijing, 100083, China

H

Hao Feng

Laboratory of Material Surface Engineering and Nanofabrication, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China; Science and Technology on Combustion and Explosion Laboratory, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China; State Key Laboratory of Fluorine and Nitrogen Chemicals, Xi'an Modern Chemistry Research Institute, Xi'an, Shaanxi, 710065, China

Funding

National Natural Science Foundation of China Award: 21975200

Cite This Article

Wangle Zhang, Jianguo Li, Jiabin Fang, et al. (2023). Atomic layer deposited high quality AlN thin films for efficient thermal management. Journal of Materials Chemistry A, 11(40), 21846-21856. https://doi.org/10.1039/d3ta04618d

Atomic layer deposited high quality AlN thin films for efficient thermal management

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