Physical model for the laser induced forward transfer process

Tobias C. Röder; Jürgen R. Köhler

doi:10.1063/1.3685469

journal article Feb 13, 2012

Physical model for the laser induced forward transfer process

Tobias C. Röder Jürgen R. Köhler

Applied Physics Letters Vol. 100 No. 7 · AIP Publishing

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Abstract

This paper presents a numerical model which describes the underlying physical processes during laser induced forward transfer. The laser induced forward transfer uses a pulsed laser to transfer thin layers from a transparent support to a substrate. The model predicts the threshold energies Eth as well as the blow-off time tblow, thus allowing a profound physical understanding of the transfer process. The good agreement of simulated with measured Eth and tblow of thin nickel layers demonstrates the accuracy of the model. The model shows that gasification of the soda-lime glass support is the main driving force of the transfer process.

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References

Details

Published: Feb 13, 2012
Vol/Issue: 100(7)

Authors

T

Tobias C. Röder

Institut für Photovoltaik, Universität Stuttgart 1 , Stuttgart 70569, Germany

J

Jürgen R. Köhler

Institut für Photovoltaik, Universität Stuttgart 1 , Stuttgart 70569, Germany

Cite This Article

Tobias C. Röder, Jürgen R. Köhler (2012). Physical model for the laser induced forward transfer process. Applied Physics Letters, 100(7). https://doi.org/10.1063/1.3685469

Physical model for the laser induced forward transfer process

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