Dissolution Rates of Amorphous Silica in Highly Alkaline Solution

Yuichi NIIBORI; Masahisa KUNITA; Osamu TOCHIYAMA; Tadashi CHIDA

doi:10.1080/18811248.2000.9714905

journal article Apr 01, 2000

Dissolution Rates of Amorphous Silica in Highly Alkaline Solution

Yuichi NIIBORI Masahisa KUNITA Osamu TOCHIYAMA Tadashi CHIDA

Journal of Nuclear Science and Technology Vol. 37 No. 4 pp. 349-357 · Informa UK Limited

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Details

Published: Apr 01, 2000
Vol/Issue: 37(4)
Pages: 349-357

Authors

Cite This Article

Yuichi NIIBORI, Masahisa KUNITA, Osamu TOCHIYAMA, et al. (2000). Dissolution Rates of Amorphous Silica in Highly Alkaline Solution. Journal of Nuclear Science and Technology, 37(4), 349-357. https://doi.org/10.1080/18811248.2000.9714905

Dissolution Rates of Amorphous Silica in Highly Alkaline Solution

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