Effect of Ozone on Deposition of Titanium Oxide Films from Tetraisopropoxide

Sergei Alexandrov; Leonid A. Filatov; Vera Protopopova; Marina Baryshnikova

doi:10.1149/1.3207616

journal article Sep 25, 2009

Effect of Ozone on Deposition of Titanium Oxide Films from Tetraisopropoxide

Sergei Alexandrov Leonid A. Filatov Vera Protopopova Marina Baryshnikova

ECS Transactions Vol. 25 No. 8 pp. 381-387 · The Electrochemical Society

View at Publisher Save 10.1149/1.3207616

Abstract

The effect of ozone on chemical vapor deposition of titanium dioxide films from titanium tetraisopropoxide (TTIP) has been experimentally studied. The influence of process parameters on the growth rate, structural and optical properties of TiO2 films deposited in the TTIP-Ar, TTIP-O2-Ar and TTIP-O2-O3-Ar reaction systems have been compared taking into account the results of FTIR measurements of the reaction gas phase. Ozone allows to decrease minimal deposition temperature providing formation of high quality titanium dioxide films to 240 {degree sign}C.

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Published: Sep 25, 2009
Vol/Issue: 25(8)
Pages: 381-387
License: View

Authors

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Sergei Alexandrov

A. Yu. Ishlinsky Institute for Problems in Mechanics, Russian Academy of Sciences, 101-1 Prospect Vernadskogo, Moscow 119526, Russia

Cite This Article

Sergei Alexandrov, Leonid A. Filatov, Vera Protopopova, et al. (2009). Effect of Ozone on Deposition of Titanium Oxide Films from Tetraisopropoxide. ECS Transactions, 25(8), 381-387. https://doi.org/10.1149/1.3207616

Effect of Ozone on Deposition of Titanium Oxide Films from Tetraisopropoxide

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