Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

Brian Cardineau; Ryan Del Re; Miles Marnell; Hashim Al-Mashat; Michaela Vockenhuber; Yasin Ekinci; Chandra Sarma; Daniel A. Freedman; Robert L. Brainard

doi:10.1016/j.mee.2014.04.024

journal article Sep 01, 2014

Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

Brian Cardineau Ryan Del Re Miles Marnell

Hashim Al-Mashat Michaela Vockenhuber Yasin Ekinci Chandra Sarma Daniel A. Freedman Robert L. Brainard

Microelectronic Engineering Vol. 127 pp. 44-50 · Elsevier BV

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Published: Sep 01, 2014
Vol/Issue: 127
Pages: 44-50

Authors

Cite This Article

Brian Cardineau, Ryan Del Re, Miles Marnell, et al. (2014). Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm). Microelectronic Engineering, 127, 44-50. https://doi.org/10.1016/j.mee.2014.04.024

Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

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