Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (&lt;500 Da)

Mohammad S.M. Saifullah; Anil Kumar Rajak; Kevin A. Hofhuis; Nikhil Tiwale; Zackaria Mahfoud; Andrea Testino; Prajith Karadan; Michaela Vockenhuber; Dimitrios Kazazis; Suresh Valiyaveettil; Yasin Ekinci

doi:10.1021/acsnano.4c03939

journal article Open Access Aug 20, 2024

Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)

Mohammad S.M. Saifullah

Anil Kumar Rajak Kevin A. Hofhuis Nikhil Tiwale

Zackaria Mahfoud Andrea Testino

Prajith Karadan Michaela Vockenhuber Dimitrios Kazazis

Suresh Valiyaveettil

Yasin Ekinci

ACS Nano Vol. 18 No. 35 pp. 24076-24094 · American Chemical Society (ACS)

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Citations

105

References

Details

Published: Aug 20, 2024
Vol/Issue: 18(35)
Pages: 24076-24094
License: View

Authors

M

Mohammad S.M. Saifullah

Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland; PiBond Oy, Kutojantie 2B, Espoo 02630, Finland

A

Anil Kumar Rajak

Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland

K

Kevin A. Hofhuis

Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland

N

Nikhil Tiwale

Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973-5000, United States of America

Z

Zackaria Mahfoud

Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology, and Research), 2 Fusionopolis Way, #08-03 Innovis, Singapore 138634, Republic of Singapore

A

Andrea Testino

Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland; École Polytechnique Fédérale de Lausanne, STI SMX-GE, Lausanne CH 1015, Switzerland

P

Prajith Karadan

Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland

M

Michaela Vockenhuber

Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland

D

Dimitrios Kazazis

Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland

S

Suresh Valiyaveettil

Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543, Republic of Singapore

Y

Yasin Ekinci

Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland

Cite This Article

Mohammad S.M. Saifullah, Anil Kumar Rajak, Kevin A. Hofhuis, et al. (2024). Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da). ACS Nano, 18(35), 24076-24094. https://doi.org/10.1021/acsnano.4c03939

Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (&lt;500 Da)

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Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)