Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography

Yake Wang; Jinping Chen; Yi Zeng; Tianjun Yu; Xudong Guo; Shuangqing Wang; Timothée Allenet; Michaela Vockenhuber; Yasin Ekinci; Jun Zhao; Shumin Yang; Yanqing Wu; Yi Li

doi:10.1021/acsomega.2c03445

journal article Open Access Aug 12, 2022

Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography

Yake Wang Jinping Chen

Timothée Allenet Michaela Vockenhuber Yasin Ekinci Jun Zhao

Shumin Yang Yanqing Wu

Yi Li

ACS Omega Vol. 7 No. 33 pp. 29266-29273 · American Chemical Society (ACS)

View at Publisher Save 10.1021/acsomega.2c03445

Topics

No keywords indexed for this article. Browse by subject →

References

46

[1]

Moore G. E. Proc. IEEE (2006)

[2]

10.2494/photopolymer.32.195

[3]

10.1002/advs.202102756

[4]

Extreme ultraviolet resist materials for sub-7 nm patterning

Li Li, Xuan Liu, Shyam Pal et al.

Chemical Society Reviews 10.1039/c7cs00080d

[5]

10.1021/acs.chemmater.6b03483

[6]

10.2494/photopolymer.32.711

[7]

10.1021/acsapm.1c00018

[8]

10.1039/c9tc06482f

[9]

10.1021/acsapm.0c00005

[10]

10.1021/nl304715p

[11]

10.3390/nano10081593

[12]

Evolution of patterning materials towards the Moore’s Law 2.0 Era

Dario L. Goldfarb

Japanese Journal of Applied Physics 10.35848/1347-4065/ac5534

[13]

10.3390/mi12121493

[14]

Peng X. Chin. J. Appl. Chem. (2021)

[15]

Kang S. Proc. SPIE (2008) 10.1117/12.773018

[16]

10.35848/1347-4065/ac26e5

[17]

10.7567/jjap.54.06fe02

[18]

10.1039/b805394d

[19]

10.1002/adma.200800763

[20]

10.1021/cm052452m

[21]

10.2494/photopolymer.24.9

[22]

10.1039/b514146j

[23]

10.1021/acsapm.8b00235

[24]

10.1002/mame.201700654

[25]

10.1039/c3tc31896f

[26]

10.1143/jjap.50.121602

[27]

10.1039/b514065j

[28]

Tsubaki H. Proc. SPIE (2012) 10.1117/12.916378

[29]

Takasuka M. Proc. SPIE (2011) 10.1117/12.879122

[30]

10.1021/cm702613n

[31]

10.1016/j.mee.2007.01.052

[32]

André X. Proc. SPIE (2007) 10.1117/12.722919

[33]

10.1039/b106278f

[34]

10.1139/v03-056

[35]

10.1039/c7nj04213b

[36]

10.1016/j.eurpolymj.2020.109658

[37]

10.1021/acs.jpcc.8b03031

[38]

10.1016/j.tsf.2013.02.016

[39]

Han J. Proc. SPIE (2014) 10.1117/12.2046573

[40]

10.1039/c9ra08977b

[41]

Wang Z. J. Microelectron. Manuf. (2021)

[42]

10.1007/s11426-014-5122-y

[43]

Sugie N. Proc. SPIE (2013) 10.1117/12.2011637

[44]

10.1088/2631-7990/ab70ae

[45]

10.1021/ja0255150

[46]

10.1039/d2tc01339h

Metrics

22

Citations

46

References

Details

Published: Aug 12, 2022
Vol/Issue: 7(33)
Pages: 29266-29273
License: View

Authors

Y

Yake Wang

Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China; University of Chinese Academy of Sciences, Beijing 100049, China

J

Jinping Chen

Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

Y

Yi Zeng

Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China; University of Chinese Academy of Sciences, Beijing 100049, China

T

Tianjun Yu

Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

X

Xudong Guo

Beijing National Laboratory for Molecular Sciences (BNLMS), Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China

S

Shuangqing Wang

Beijing National Laboratory for Molecular Sciences (BNLMS), Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China

T

Timothée Allenet

Paul Scherrer Institute, Laboratory for Micro and Nanotechnology, CH-5232 Villigen, Switzerland

M

Michaela Vockenhuber

Paul Scherrer Institute, Laboratory for Micro and Nanotechnology, CH-5232 Villigen, Switzerland

Y

Yasin Ekinci

Paul Scherrer Institute, Laboratory for Micro and Nanotechnology, CH-5232 Villigen, Switzerland

J

Jun Zhao

Shanghai Synchrotron Radiation Facility, Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China

S

Shumin Yang

Shanghai Synchrotron Radiation Facility, Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China

Y

Yanqing Wu

Shanghai Synchrotron Radiation Facility, Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China

Y

Yi Li

Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China; University of Chinese Academy of Sciences, Beijing 100049, China

Funding

National Natural Science Foundation of China Award: 21873106

Chinese Academy of Sciences

Cite This Article

Yake Wang, Jinping Chen, Yi Zeng, et al. (2022). Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography. ACS Omega, 7(33), 29266-29273. https://doi.org/10.1021/acsomega.2c03445

Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography

You May Also Like