journal article Open Access Jun 12, 2020

Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review

Micromachines Vol. 11 No. 6 pp. 589 · MDPI AG
View at Publisher Save 10.3390/mi11060589
Abstract
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X-ray optics. Microfabrication is usually achieved by dry-etch with reactive ions and KOH based wet-etch, metal assisted chemical etching (MacEtch) is emerging as a new etching technique that allows huge aspect ratio for feature size in the nanoscale. To date, a specialized review of MacEtch that considers both the fundamentals and X-ray optics applications is missing in the literature. This review aims to provide a comprehensive summary including: (i) fundamental mechanism; (ii) basics and roles to perform uniform etching in direction perpendicular to the <100> Si substrate; (iii) several examples of X-ray optics fabricated by MacEtch such as line gratings, circular gratings array, Fresnel zone plates, and other X-ray lenses; (iv) materials and methods for a full fabrication of absorbing gratings and the application in X-ray grating based interferometry; and (v) future perspectives of X-ray optics fabrication. The review provides researchers and engineers with an extensive and updated understanding of the principles and applications of MacEtch as a new technology for X-ray optics fabrication.
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Details
Published
Jun 12, 2020
Vol/Issue
11(6)
Pages
589
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Funding
European Commission Award: ERC-2012-StG 31’0005 “PhaseX”
SNF Award: SNF Sinergia Grant CRSII5_18356 “Clinical GI-BCT”
Swiss Nanoscience Institute Award: NanoArgovia Grant 13.01 “NANOCREATE”
Cite This Article
Lucia Romano, Marco Stampanoni (2020). Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review. Micromachines, 11(6), 589. https://doi.org/10.3390/mi11060589
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