CMOS-Compatible Catalyst for MacEtch: Titanium Nitride-Assisted Chemical Etching in Vapor phase for High Aspect Ratio Silicon Nanostructures

Jeong Dong Kim; Munho Kim; Clarence Chan; Nerissa Draeger; James J. Coleman

doi:10.1021/acsami.9b00871

journal article Jul 02, 2019

CMOS-Compatible Catalyst for MacEtch: Titanium Nitride-Assisted Chemical Etching in Vapor phase for High Aspect Ratio Silicon Nanostructures

Jeong Dong Kim Munho Kim

Clarence Chan Nerissa Draeger James J. Coleman

ACS Applied Materials & Interfaces Vol. 11 No. 30 pp. 27371-27377 · American Chemical Society (ACS)

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Metrics

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Citations

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References

Details

Published: Jul 02, 2019
Vol/Issue: 11(30)
Pages: 27371-27377
License: View

Authors

J

Jeong Dong Kim

Department of Electrical and Computer Engineering, Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, Champaign, Illinois 61801, United States

M

Munho Kim

Department of Electrical and Computer Engineering, Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, Champaign, Illinois 61801, United States

C

Clarence Chan

Department of Electrical and Computer Engineering, Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, Champaign, Illinois 61801, United States

N

Nerissa Draeger

Lam Research Corporation, Fremont, California 94538, United States

J

James J. Coleman

Department of Electrical Engineering and Department of Materials Science, University of Texas at Dallas, Richardson, Texas 75080, United States

Funding

Zhejiang University

University of Illinois at Urbana-Champaign

Lam Research Corporation

Cite This Article

Jeong Dong Kim, Munho Kim, Clarence Chan, et al. (2019). CMOS-Compatible Catalyst for MacEtch: Titanium Nitride-Assisted Chemical Etching in Vapor phase for High Aspect Ratio Silicon Nanostructures. ACS Applied Materials & Interfaces, 11(30), 27371-27377. https://doi.org/10.1021/acsami.9b00871

CMOS-Compatible Catalyst for MacEtch: Titanium Nitride-Assisted Chemical Etching in Vapor phase for High Aspect Ratio Silicon Nanostructures

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